The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 1982
Filed:
Jun. 28, 1978
Tadashi Takano, Yokosuka, JP;
Motoo Mizusawa, Kamakura, JP;
Shinichi Betsudan, Amagasaki, JP;
Shigeru Sato, Amagasaki, JP;
Nippon Telegraph & Telephone Public Corp., Tokyo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A subreflector and reflectors in a primary radiation system, these constituting an offset dual-reflector aerial, are subjected to the so-called reflector-surface shaping. The main reflector is formed as a part of a revolutional paraboloid, and is a combination of a number of congruent reflector-segments. With such an arrangement, the manufacturing cost of a large-sized main reflector is reduced. The production error, and the aerial gain reduction and the deterioration of a wide-angle directivity due to the production error are minimized.