The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 1982
Filed:
Jul. 15, 1980
Applicant:
Inventors:
Assignee:
Murata Manufacturing Co., Ltd., Kyoto, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
204298 ; 2041 / ;
Abstract
There is disclosed a sputtering apparatus for the deposition of thin films of a material other than metals on substrates, comprising a pair of opposed electrodes one of which is adapted to mount a substrate, wherein a target of a material other than metals, from which thin-film-forming atoms are ejected by ion-bombardment during sputtering, is mounted on the other electrode, said target comprising at least two target members stacked on one another. This target installation prevents thin films of a material other than metals from contamination resulting from breakage of the target which in turn results from an increase of the film-forming rate or physical properties of the target material.