The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 1982
Filed:
Aug. 13, 1979
Applicant:
Inventors:
Assignee:
Canadian Patents & Development Ltd., Ottawa, CA;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S / ;
U.S. Cl.
CPC ...
372 59 ; 372 60 ; 372 83 ;
Abstract
A method and apparatus is described for reducing the gas consumption rate by controlling the gas composition in a repetitively pulsed high pressure and/or high energy density TE CO.sub.2 laser. Detrimental gas species formed in the discharge are removed by chemical reaction in the gas phase and the reaction products are removed by a trap in a recirculator loop. In particular, the primary detrimental species is oxygen, the reducing gas added to remove this is hydrogen or deuterium and the resulting oxides of hydrogen or deuterium are removed by a molecular sieve.