The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 1982
Filed:
May. 28, 1980
Kenzo Ohji, Hirakata, JP;
Osamu Yamazaki, Suita, JP;
Kiyotaka Wasa, Nara, JP;
Shigeru Hayakawa, Hirakata, JP;
Abstract
A method of making a thin film by vapor depositing a source material onto a substrate, in which a mask plate is provided between the source material and the substrate at a location such that d<5l in which d denotes the distance between the mask plate and the substrate and l denotes the mean free path of the evaporated particles, or s<l in which s denotes the distance between the mask plate and the source material. The mask plate moves relative to the substrate and/or the source material during the deposition. Configuration of the mask plate is designed so as to equalize deposition rates through the above-mentioned movement.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile