The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 1982
Filed:
May. 13, 1980
Shin-Etsu Chemical Co. Ltd., Tokyo, JP;
Abstract
The invention provides a novel method for preventing bleeding of a plasticizer or other additive ingredients contained in a shaped article of a vinyl chloride-based resin composition on to the surface of the article by the treatment with low temperature plasma. Different from conventional procedures for the plasma treatment, much improved reliability and reproducibility as well as effectiveness are obtained by subjecting the article to intermittent exposure to the plasma atmosphere instead of continuous exposure. In the inventive method, the overall treatment time is an alternate sequence of exposure times, each being of the length of 0.001 second to 1000 seconds, and repose times, each being also of the length of 0.001 second to 1000 seconds. The gas for the plasma atmosphere is desirably an inorganic gas selected from the gases other than oxygenic gases, halogen containing gases and sulfur containing gases.