The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 1982
Filed:
Oct. 29, 1980
Applicant:
Inventors:
Rudolf A Heinecke, Harlow, GB;
David J Moule, Saffron Walden, GB;
Assignee:
International Standard Electric Corporation, New York, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ; G03B / ;
U.S. Cl.
CPC ...
356399 ; 350 63 ; 350 81 ; 355 76 ;
Abstract
A high power microscope is fitted with a gas jet arrangement for blowing a thin flexible mask into local contact with a semiconductor substrate so as to facilitate mask alignment.
Heinecke, Rudolf. (1982). Mask alignment for semiconductor processing (U.S. Patent No. 4315692). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4315692
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile