The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 1982
Filed:
May. 05, 1980
Applicant:
Inventor:
Richard S Fisch, St. Paul, MN (US);
Assignee:
Minnesota Mining and Manufacturing Company, St. Paul, MN (US);
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430326 ; 430275 ; 430276 ; 430278 ; 430331 ; 430526 ; 252 795 ;
Abstract
A developing solution for use with imaging film comprising a photoresist layer over an aluminum coated substrate and the process of developing the film are shown to be rapid acting. The developing solution comprises an aqueous solution having a pH of at least 12.5 of an alkali metal hydroxide and a chelating agent having a stability constant for Al.sup.+3 of at least 6.70.
Fisch, Richard. (1982). Photoresist developers and process (U.S. Patent No. 4314022). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4314022
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile