The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 1982
Filed:
Aug. 11, 1980
David F O'Brien, Rochester, NY (US);
Thomas H Whitesides, Rochester, NY (US);
Richard T Klingbiel, Rochester, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A photopolymerizable monomer comprising a lipid having at least one hydrophobic acyl chain containing at least two conjugated acetylenic linkages is useful in preparing radiation-sensitive compositions and photographic elements comprising a plurality of liposomes. Further, processes for photopolymerizing the radiation-sensitive compositions and for forming an image in the photographic elements comprise exposing the lipid to radiation, heating the lipid to a temperature equal to or above a first transition temperature of the lipid to render it insensitive to further exposure, and optionally cooling the lipid to a temperature equal to or below a second phase transition temperature of the lipid to render it again sensitive to further exposure. The monomeric lipids, when photopolymerized, form polymeric lipids exhibiting different solubility and liposome wall permeability as compared to the unpolymerized monomeric lipids.