The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 1982
Filed:
Jul. 16, 1980
Kiyoshi Imada, Omiya, JP;
Susumu Ueno, Ibaraki, JP;
Yasuhide Nishina, Ibaraki, JP;
Hirokazu Nomura, Ibaraki, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
The invention provides a novel method for modifying surface properties, e.g. liability to surface bleeding of plasticizers and other additives and affinity with water, of shaped articles of polymeric materials such as vinyl chloride-based resins and silicone rubbers by the treatment with low temperature plasma of a gas. The plasma treatment in the inventive method is carried out in two steps with the first step carried out in an atmosphere of oxygen and the second step carried out in a non-oxidizing gas such as argon and carbon monoxide. Different from the conventional methods of plasma treatment which suffer from poor reproducibility and low effectiveness, the inventive method can give good reproducibility and high effectiveness presumably owing to the removal of the surface stain in the first step plasma treatment.