The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 1982
Filed:
Jul. 15, 1980
Applicant:
Inventor:
Donald J Sykes, Upper Saddle River, NJ (US);
Assignee:
Philip A. Hunt Chemical Corp., Palisades Park, NJ (US);
Primary Examiner:
Int. Cl.
CPC ...
C23F / ; C03C / ; C03C / ; B44F / ;
U.S. Cl.
CPC ...
156640 ; 1566591 ; 156666 ; 156902 ; 252 795 ;
Abstract
An alkaline copper etching working bath for dissolving copper containing an etch accelerating additive selected from the group consisting of cyanamide and its precursors. The accelerating additives when added to the alkaline copper etching bath increase the etch rate and reduce undercut. The bath includes cupric ions, an ammonium salt such as a chloride and/or a carbonate, ammonium hydroxide to achieve a pH greater than 7, water, and the etch accelerating additive. The invention includes etching baths, methods for their use, the preparation of a certain etch accelerating additive and the provision of certain cyanamide precursors.