The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 12, 1982

Filed:

Feb. 20, 1980
Applicant:
Inventors:

Osamu Tabata, Ikeda, JP;

Mitoshi Waseda, Moriyama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; B05D / ; C03C / ; C23C / ;
U.S. Cl.
CPC ...
427 82 ; 148-63 ; 148-635 ; 427 91 ; 427 94 ; 427 95 ; 427109 ; 427124 ; 4271262 ; 4271263 ; 4271264 ; 4271266 ; 427164 ; 427166 ; 427167 ; 427250 ; 427252 ; 427253 ; 427255 ; 4272551 ; 4272552 ; 4272553 ;
Abstract

A gas containing a film forming component is shot through a shooting means in the form of a high speed stream of gas. The gas stream is shot toward the surface of a heated base where a film is to be deposited. The stream is directed at an inclination relative to the base surface. As the stream approaches the base surface it is subjected to the action of a high speed sucking stream of air produced by a sucking means. The sucking means causes the gas stream to flow in a V-shaped path with the upper ends of the V located at the shooting means and the sucking means, with the vertex of the V located therebetween. The film coating is placed on the surface of the base by allowing the base surface to contact the V-shaped path of the stream at the vertex of the path.


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