The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 1982

Filed:

Apr. 11, 1980
Applicant:
Inventor:

Osamu Kudo, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
307303 ; 357 22 ; 357 48 ; 357 51 ; 357 86 ;
Abstract

A diffused resistor for an integrated circuit comprising two resistor portions. Each of the resistor portions comprises a semiconductor substrate of a first conductivity type, an isolated epitaxial region of a second conductivity type, a diffused region (i.e. a resistance layer) of the first conductivity type, a contacting region of the second conductivity type and terminals. An end portion of the resistance layer in one of the resistor portions is connected to one of the ends of the resistance layer in the other resistor portion so that these resistance layers combine to form a resistor. In the other resistor portion the other end portion of the resistance layer is connected to the contacting region. Depletion layers generated in the resistor portions vary so as to maintain the resistance of the diffused resistor constant.


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