The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 1982
Filed:
Jul. 03, 1980
Geoffrey L Harding, Glebe, AU;
David R McKenzie, Artarmon, AU;
Brian Window, Hornsby Heights, AU;
Anthony R Collins, Paddington, AU;
University of Sydney, Sydney, AU;
Abstract
A graded surface coating is reactively sputtered onto a tubular substrate by advancing the substrate in an axial direction through a cylindrical sputtering chamber in the presence of a sputter supporting gas. The sputtering chamber includes a cathode liner from which metal is sputtered onto the substrate. A reactive gas is directed into the sputtering chamber from a feed point outside of the chamber, whereby reactive sputtering occurs within the chamber. The reactive gas is induced to flow into the chamber in a direction counter to the direction of advancement of the substrate whereby, as the substrate is progressively advanced through the chamber and the applied coating gradually increases in thickness, the proportion of the reactive gas constituent in the coating increases relative to the metal constituent proportion with increasing thickness of the coating.