The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 1982
Filed:
May. 09, 1979
Applicant:
Inventor:
Ties S Te Velde, Eindhoven, NL;
Assignee:
U.S. Philips Corporation, New York, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F / ;
U.S. Cl.
CPC ...
156644 ; 156652 ; 156656 ; 1566591 ;
Abstract
A method for manufacturing an electrode which is secured to a supporting plate by means of flexible strip-shaped parts so as to be movable. The method includes the steps of providing a first layer of material which can be etched by means of a first etchant and a second layer which can be etched by means of a second etchant. The method also includes the step of providing by means of a photoetching method and a second etchant a plurality of apertures in the parts of the second layer which should not remain secured to the supporting plate. Parts of the first layer are removed by underetching by the apertures in the second layer with the first etchant.