The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 1982

Filed:

Jul. 12, 1979
Applicant:
Inventors:

Takashi Kajikawa, Miki, JP;

Minoru Makimura, Akashi, JP;

Satoru Kunise, Akashi, JP;

Satoshi Furuitsu, Kakogawa, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C21D / ;
U.S. Cl.
CPC ...
148 166 ; 148 203 ; 204164 ;
Abstract

Disclosed is an improved ion-nitriding process comprising ion-nitriding a workpiece at a high voltage level of glow discharge in a gas atmosphere resulting from the introduction of a gas mixture containing a specific amount of ammonia into a nitriding reactor, and then, further ion-nitriding the same workpiece at a lower voltage level of glow discharge in a gas atmosphere resulting from the introduction of a gas mixture not containing ammonia into the reactor.


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