The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 1982
Filed:
Oct. 05, 1979
Joseph H Apfel, Santa Rosa, CA (US);
Charles K Carniglia, Santa Rosa, CA (US);
Optical Coating Laboratory, Inc., Santa Rosa, CA (US);
Abstract
A high reflectance mirror utilizing a dielectric stack having multiple layers of low and high refractive index material, at least one of which is absorbing at the design wavelength. At least one pair of layers is formed on a substructure with the thickness of the individual layers being both different from a quarterwave optical thickness and preselected to maximize the reflectance of the mirror. Mirrors in which both dielectric materials in the stack have different absorptances at the design wavelength are disclosed with the layer thickness of one or more optimum pairs formed on a substructure being different from a quarterwave optical thickness such that the layers of higher absorptance material are less than a quarterwave optical thickness and the layers of lower absorptance material are more than a quarterwave optical thickness. The individual thicknesses of the layers are optimized to provide maximum reflectance, leading to a non-periodic stack when a substantial number of such optimum pairs of layers are utilized.