The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 1981
Filed:
Mar. 14, 1980
Applicant:
Inventors:
Keiji Kubo, Amagasaki, JP;
Tetsuo Ishihara, Itami, JP;
Assignee:
Daicel Chemical Industries Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; C08G / ;
U.S. Cl.
CPC ...
525504 ; 430190 ; 430192 ; 430302 ; 430326 ; 528158 ; 528161 ; 528162 ;
Abstract
Photosensitive compositions which contain as a photosensitive resin prepared by the condensation of the co-condensated novolak resin of the mixture of phenols such as in a combination of tert-butyl (or tert-octyl) phenol and phenol and/or cresol and formaldehyde, with o-quinonediazido sulfonic (or carboxylic) acid or contain said novolak resin as an additive for a photosensitive o-quinonediazido compound are discosed.
Kubo, Keiji. (1981). Photosensitive compositions with reaction product of novolak (U.S. Patent No. 4308368). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4308368
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile