The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 1981

Filed:

Mar. 20, 1980
Applicant:
Inventors:

Takenori Omichi, Fujinomiya, JP;

Takeshi Konno, Fujinomiya, JP;

Sumitaka Tatsuta, Fujinomiya, JP;

Assignee:

Fuji Photo Film Co., Ltd., Minami-ashigara, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430523 ; 430539 ; 430930 ; 430935 ; 430531 ;
Abstract

A process for producing a photographic light-sensitive material comprising providing a first light-sensitive photographic emulsion layer on one side of a support having a surface resistivity greater than 10.sup.14 .OMEGA. and a thickness of not more than 230.mu. and providing a light-sensitive photographic emulsion layer or a gelatin-containing back layer on the opposite side of the support wherein between the time the first emulsion layer is coated and the time the opposite surface of the support is coated, (i) the opposite surface of the support is prevented from coming into contact with anything except rolls having a diameter larger than about 50 mm, and (ii) the water/gelatin weight ratio in the photographic emulsion layer(s) coated on the first surface of the support prior to coating the second surface is not less than 1. The process is particularly applicable to production of X-ray films.


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