The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 1981
Filed:
Feb. 20, 1981
Harold J Rafson, Highland Park, IL (US);
Egbert deVries, Kettering, OH (US);
Quad Environmental Technologies Corp., Highland Park, IL (US);
Abstract
Apparatus, particularly adapted to the removal of odorous constituents from waste gas streams, is described. The apparatus comprises a treatment vessel or chamber preferably of cylindrical shape containing a coaxially-mounted exhaust duct which serves also as a columnar support for the chamber top or roof. An odorous gas is introduced tangentially into an upper portion of the reactor and is caused to move in a spiral flow around the central column and to exahust through an exit port into the central duct adjacent the chamber floor. An arcuate, spiral baffle is mounted on the chamber floor and extends continuously from the inner vessel wall to the central duct thereby directing gas flow into the exit port to reduce pressure drop through the treatment chamber. A finely divided spray of a reagent reactive toward the odorous compound is introduced into the chamber through nozzles ringing the chamber wall or mounted in the chamber roof. Reagent droplets coalesce on the chamber floor and are removed from the vessel.