The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 1981
Filed:
Apr. 23, 1980
Takashi Uchiyama, Yokohama, JP;
Ryoichi Suzuki, Kawasaki, JP;
Nobuaki Date, Kawasaki, JP;
Yoji Sugiura, Yokohama, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A slit exposure shutter having the front and rear screens thereof respectively arranged to be driven by a source of an electromagnetic driving force is provided with a minimum slit width insuring means which prevents uneven exposure resulting from difference in travelling speed between the front and rear shutter screens during a high speed shutter operation and particularly prevents a total absence of the slit, the shutter is also provided with a nullifying means which nullifies the insuring means when the shutter screens are on their return travels.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile