The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 1981
Filed:
Jun. 19, 1980
Roland Thoms, Mullheim, DE;
Buckbee-Mears Company, St. Paul, MN (US);
Abstract
A process for forming openings of varying sizes in an aperture mask by determining an over-etch factor wherein the over-etch factor is determined by the time of etching through an etchant resist pattern located on opposite sides of an aperture mask material to produce an opening of predetermined size and shape followed by individually sizing the opening in the etchant resist so that etching from both sides of the aperture mask material produces etched openings of various sizes throughout the aperture with the sizing of the opening in the etchant resist characterized by having substantially constant over-etch factor even though the final openings in the aperture masks are of various sizes.