The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 1981
Filed:
Aug. 07, 1979
Applicant:
Inventors:
David Edwards, Jr, Bellport, NY (US);
Christopher P Lanni, Shirley, NY (US);
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
B01D / ; H01J / ;
U.S. Cl.
CPC ...
250489 ; 313-7 ;
Abstract
An ion gauge having a reduced 'x-ray limit' and means for measuring that limit. The gauge comprises an ion gauge of the Bayard-Alpert type having a short collector and having means for varying the grid-collector voltage. The 'x-ray limit' (i.e. the collector current resulting from x-rays striking the collector) may then be determined by the formula: ##EQU1## where: I.sub.x ='x-ray limit',
Edwards, Jr, David. (1981). Method of determining the x-ray limit of an ion gauge (U.S. Patent No. 4302679). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4302679
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile