The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 17, 1981

Filed:

Aug. 30, 1979
Applicant:
Inventors:

Akiyoshi Suzuki, Tokyo, JP;

Ryozo Hiraga, Yokohama, JP;

Hideki Yoshinari, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
250216 ; 250548 ;
Abstract

An alignment device of a type, wherein an alignment pattern provided on a mask for fabrication of a semiconductor circuit element and an alignment pattern provided on a wafer are photoelectrically read in a dark field by a flying spot scanning system or a flying image scanning system to detect a relative positional relationship between the mask and the wafer, and a desired positional relationship is obtained by moving at least one of the mask and wafer on the basis of a detected signal. The novel feature of this alignment device resides in that the size of a line forming the alignment pattern along the scanning line is twice or more as large as the size of the scanning spot.


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