The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 17, 1981

Filed:

Dec. 10, 1979
Applicant:
Inventors:

Erich Hafner, Tinton Falls, NJ (US);

Robert J Ney, Belleair, FL (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
29 2535 ; 228 18 ; 228 / ; 228221 ;
Abstract

Disclosed is a semi-automatic processing system for the production of components requiring the deposition of metallization and assembly in an oil free ultra-high vacuum environment. The system is comprised of a plurality of interconnected tubular high vacuum chambers for separately performing ultra-violet cleaning, bake out, plating and sealing of, for example, quartz crystal resonator units, in an in-line configuration adapted for continuous cycle processing of components. The major elements of the system include: (a) a belt type transport which is adapted to convey one or more components through the respective chamber and into an adjoining chamber through an intermediate gate valve; (b) manipulators for handling the component parts inside the vacuum chambers; (c) long life highly directional evaporation sources for evaporated metal deposition on selected component parts; and (d) a sealing apparatus for hermetically sealing the components after evaporation without exposure to atmosphere. Each chamber accordingly is separated from all adjoining chambers by gate valves which make each chamber a self contained modular unit that, for ease of servicing, can be removed and/or inserted into the system without affecting the vacuum integrity of the other chambers.


Find Patent Forward Citations

Loading…