The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 1981

Filed:

Aug. 09, 1978
Applicant:
Inventors:

Hideo Ochi, Kawasaki, JP;

Yumi Shibata, Tokyo, JP;

Kohtaro Nagasawa, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; G03C / ;
U.S. Cl.
CPC ...
430286 ; 96 351 ; 96 362 ; 20415916 ; 20415922 ; 430280 ; 430296 ; 430313 ;
Abstract

A resist material curable by irradiation with high energy radiation such as electron beams, X-rays, ion beams, neutron beams, .gamma.-rays or deep ultraviolet light but substantially non-curable by irradiation with light having a wavelength of about 300 nm or more, the resist material comprising, as a main component, a solvent-soluble polymer containing an ethylenically unsaturated double bond, the polymer being obtained by reacting (a) a polymer having a plurality of oxirane rings therein and (b) a monomer containing (i) at least one ethylenically unsaturated double bond and (ii) one functional group capable of opening the oxirane rings, and then opening the unreacted oxirane rings.


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