The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 1981
Filed:
Nov. 24, 1980
Applicant:
Inventors:
Ling K Hung, Edison, NJ (US);
Allen Bloom, East Windsor, NJ (US);
Assignee:
RCA Corporation, New York, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430270 ; 20415914 ; 20415915 ; 430271 ; 430281 ; 430311 ; 430905 ; 430909 ;
Abstract
Improved aqueous photoresist compositions comprising a water-soluble polymeric material and a photosensitive cross-linking agent, therefore, having the formula: ##STR1## wherein, A and B are independently amino or nitro and M is an alkali metal or ammonium ion, and process of exposing and developing same.
Hung, Ling. (1981). Water-based photoresists using stilbene compounds as crosslinking agents (U.S. Patent No. 4299910). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4299910
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile