The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 1981
Filed:
Jul. 23, 1979
Applicant:
Inventor:
Benjamin B Meckel, Del Mar, CA (US);
Assignee:
Spin Physics, Inc., San Diego, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
2041 / ; 204298 ;
Abstract
The advantages of magnetron sputtering can be applied to magnetic target materials by substantially reducing the saturation magnetization of the target material temporarily, such as by heating the target material to its Curie point, and magnetron sputtering the magnetic material while in such a state of reduced magnetization. Disclosed herein is a magnetic target plate which is structured to facilitate heating of the plate to its Curie point by the thermal energy inherent in the conventional sputtering process.