The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 1981
Filed:
Oct. 09, 1979
Josef Pfeifer, Therwil, CH;
Dieter Reinehr, Kandern, DE;
Giba-Geigy Corporation, Ardsley, NY (US);
Abstract
There are described transparent polyamides, and processes for producing them, which polyamides consist of recurring structural elements of the formula I ##STR1## or of recurring structural elements of the formula II ##STR2## [carbonyl groups in the structural elements (II) bound in the 1,3- and/or 1,4-position to the benzene nucleus, R.sub.1 =C.sub.1-12 -alkyl, R.sub.2 =H, C.sub.1-12 -alkyl, R.sub.3 =C.sub.1-12 -alkyl, C.sub.4-12 -cycloalkyl, C.sub.7-8 -aralkyl, unsubstituted or substituted aryl, R.sub.4 =H, C.sub.1-12 -alkyl, C.sub.4-12 -cycloalkyl, C.sub.7-8 -aralkyl, or unsubstituted or substituted aryl, or R.sub.3 /R.sub.4 together=C.sub.3-11 -alkylene, R.sub.5 /R.sub.6 independently of one another=hydrogen or methyl, and R.sub.7 /R.sub.8 together=C.sub.3-11 -alkylene]. The polyamides according to the invention are suitable for producing transparent moulded articles of the widest variety, and are distinguished in particular by low water absorption, high stability to hydrolysis, and/or good dimensional stability under the action of moisture or humidity.