The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 1981

Filed:

Jun. 20, 1980
Applicant:
Inventors:

Takeo Moriya, Kawagoe, JP;

Toshio Yamagata, Urawa, JP;

Assignee:

Kimoto & Co., Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ; G03C / ; G03C / ;
U.S. Cl.
CPC ...
430149 ; 430-5 ; 430150 ; 430157 ; 430176 ; 430292 ; 430294 ; 430295 ; 430326 ;
Abstract

A photosensitive material and a process for developing the same are disclosed. The photosensitive material is obtained by forming on a base material a layer of photosensitive composition comprising (A), 100 weight parts of a water soluble resin binder containing at least 60 weight % of acrylamide-diacetoneacrylamide copolymer, the copolymerization ratio of acrylamide and diacetoneacrylamide being 8:2-5:5 and average polymerization degree being 300-1500, and (B), 5-20 weight parts of a water soluble diazonium salt. The photosensitive material is developed by using an aqueous alkali solution.


Find Patent Forward Citations

Moriya, Takeo. (1981). Photosensitive positive diazo material with copolymer of acrylamide and (U.S. Patent No. 4296193). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4296193

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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