The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 1981
Filed:
Apr. 02, 1980
Applicant:
Inventors:
Assignee:
Japan Synthetic Rubber Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430286 ; 20415914 ; 20415922 ; 430287 ; 430288 ;
Abstract
A photoresist composition comprising a cyclized product obtained by contacting a conjugated diene polymer or copolymer having unsaturations in the main chain or side chains with a fluorine-containing substituted sulfonic acid compound represented by the formula:
Harita, Yoshiyuki. (1981). Photoresist composition containing modified cyclized diene polymers (U.S. Patent No. 4294908). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4294908
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile