The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 1981
Filed:
Jun. 11, 1979
Lieng-Huang Lee, Webster, NY (US);
Xerox Corporation, Stamford, CT (US);
Abstract
Disclosed is a novel hole trapping layer and the use of this layer in an overcoated photoresponsive device, this hole trapping layer being comprised of materials of the following formulas: ##STR1## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, and R.sup.6 which may be the same or different radicals, are selected from aliphatic, substituted aliphatic, aromatic, and substituted aromatic, the substituents including for example alkyl, halogen and the like, x and y are numbers from 2 to about 10 and preferably from 2 to about 4, m and n are numbers of from 1 to 3, the sum of m and n being equal to 4, and Z is a sulfonyl (--SO.sub.2) or a carboxyl (--CO.sub.2) radical. Examples of aliphatic radicals include alkyl of from 1 to about 20 carbon atoms such as methane, ethane, propane, butane, isobutane, pentane, neopentane, heptane, decane, tetradecane, eicosane, and the like. Illustrative examples of aromatic radicals include those containing from about 6 to about 20 carbon atoms such as phenyl, naphthyl, anthryl and the like.