The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 1981

Filed:

Jan. 16, 1980
Applicant:
Inventor:

Alfred R Dozier, Huntington Beach, CA (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118723 ; 118721 ; 118728 ; 118500 ; 427 39 ;
Abstract

Apparatus for supporting a plurality of wafer-like substrates so as to be treatable in a plasma environment. At least three plate-like electrically conductive electrodes are provided. They are parallel to and spaced from one another along an axis. A support adjacent to each electrode supports a wafer-like substrate against at least one of the faces of at least one electrode of a pair of adjacent electrodes. A first conductive bus is conductively connected to a first set of alternate ones of the electrodes, and a second conductive bus is also provided. An individual capacitative coupling is respective to each member of a second set of the electrodes and is connected to the second bus so that each pair of adjacent electrodes and the respective capacitative coupling are in series connection, and all of the pairs of electrodes are in parallel connection.


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