The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 1981
Filed:
Nov. 05, 1979
Applicant:
Inventors:
Minoru Watanabe, Tokyo, JP;
Mitsuhiro Oikawa, Kawasaki, JP;
Toshio Nishimura, Yokohama, JP;
Masao Asada, Yokohama, JP;
Masao Tezuka, Tokyo, JP;
Tsurahide Cho, Kawasaki, JP;
Assignee:
Tokyo Shibaura Denki Kabushikikaisha, Kawasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
427 64 ; 427 68 ; 2523 / ; 428404 ;
Abstract
Disclosed is a method for surface treatment of phosphor particles which comprises forming a continuous film of silicon dioxide on the surface of each phosphor particle by treating the phosphor particle with a solution containing an aqueous solution of organic alkali and silicon dioxide dissolved therein.