The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 1981

Filed:

Feb. 28, 1980
Applicant:
Inventors:

Jacky Vanhumbeeck, Brugge, BE;

Hubert De Steur, Drongen, BE;

Guido Heyneman, Knokke, BE;

Chris Vandenbossche, Zwijnaarde, BE;

Assignee:

Siemens Aktiengesellschaft, Berlin & Munich, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ; B05D / ;
U.S. Cl.
CPC ...
2323 / ; 118689 ; 422 62 ; 4274431 ;
Abstract

A control apparatus for automatically controlling at least the concentration of copper-ions, hydroxyl-ions and formaldehyde-ions in an electroless copper plating bath and independently analyzing, displaying and replenishing the concentration of each such ions whereby a sample for each of the ions is discontinuously removed from the plating bath and diluted with a specific amount of water and, independently of one another, the copper-ion concentration is colorimetrically analyzed, displayed and replenished as needed, the hydroxyl-ion concentration is potentiometrically analyzed, displayed and replenished as needed and the formaldehyde-ion concentration is amperometrically analyzed, displayed and replenished as needed.


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