The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 1981
Filed:
Jun. 23, 1980
Applicant:
Inventors:
Ralph A Messing, Horseheads, NY (US);
Robert A Oppermann, Painted Post, NY (US);
Lynn B Simpson, Corning, NY (US);
Milton M Takeguchi, Big Flats, NY (US);
Assignee:
Corning Glass Works, Corning, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12N / ;
U.S. Cl.
CPC ...
435176 ; 435813 ; 435839 ; 435842 ; 435849 ; 435850 ; 435871 ; 435942 ;
Abstract
A method for the continuous culturing of microbes in a plug-flow reactor which comprises the steps of:
Quick Actions:
Messing, Ralph. (1981). Method for continuous culturing of microbes (U.S. Patent No. 4286061). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4286061
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile