The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 1981

Filed:

Nov. 15, 1979
Applicant:
Inventors:

Akira Nahara, Asaka, JP;

Yoshihiro Ono, Asaka, JP;

Tomizo Namiki, Asaka, JP;

Shigeo Harada, Asaka, JP;

Yuzo Mizobuchi, Asaka, JP;

Tomoaki Ikeda, Asaka, JP;

Assignee:

Fuji Photo Film Co., Ltd., Minami-ashigara, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03C / ;
U.S. Cl.
CPC ...
430270 ; 430302 ; 430413 ; 430495 ; 430496 ; 430309 ; 430417 ; 430541 ; 430292 ; 430415 ; 430540 ; 430542 ;
Abstract

An image forming material comprising a support having thereon a layer composed of a Ge-S composition or a Ge-S-X composition wherein X represents at least one element selected from the group consisting of Al, Si, Mg, Ti, V, Mn, Co, Ni, Sn, Zn, Pd, In, Se, Te, Fe, I, P and O which undergoes a structural change capable of being detected optically, electrically or chemically upon exposure imagewise to light wherein the Ge-S or Ge-S-X composition layer has a thickness of at least about 300 A and contains therein at least one element selected from the group consisting of Ag, Cu and Pb in an amount of more than 2 atoms of Ag, Cu and/or Pb based on 100 atoms of the Ge-S composition or the Ge-S-X composition.


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