The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 1981
Filed:
Jan. 17, 1980
Applicant:
Inventor:
Addison B Jones, La Mirada, CA (US);
Assignee:
Rockwell International Corporation, El Segundo, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B32B / ; B32B / ; B05D / ;
U.S. Cl.
CPC ...
428195 ; 427 431 ; 427261 ; 427264 ; 427270 ; 427271 ; 428209 ; 428332 ; 428337 ; 428913 ;
Abstract
There is described a unique mask and method of making same. The mask is especially useful in high resolution fabrication techniques such as in making magnetic bubble domain structures, semiconductor device structures and the like. The mask includes a relatively thin membrane of suitable density and material to be substantially transparent to various types of radiation such as, but not limited to, E-beams, x-rays and the like. A pattern of material which is substantially opaque to the same radiation is provided on the membrane. To the extent necessary, a suitable auxiliary support member is attached to the membrane for supporting same.