The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 1981

Filed:

Nov. 02, 1978
Applicant:
Inventors:

George L Fletcher, Jr, Pittsford, NY (US);

Richard A deMauriac, Webster, NY (US);

Stewart H Merrill, Rochester, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ; G03C / ;
U.S. Cl.
CPC ...
430141 ; 430151 ; 430169 ; 430155 ; 430158 ; 430160 ; 430162 ; 430351 ; 430353 ; 430495 ; 430523 ; 430545 ; 430618 ; 430620 ; 430611 ; 430531 ;
Abstract

In a photothermographic element comprising (A) at least one photosensitive layer comprising a photosensitive component, such as photosensitive silver halide or a diazotype photosensitive material, (B) at least one layer comprising a processing agent for the photosensitive component and (C) a separation polymer between (A) and (B), increased preexposure storage stability is provided by a polysulfonamide as separation polymer (C). After imagewise exposure of the photothermographic element, an image can be developed by merely heating the element to moderately elevated temperatures.


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