The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 1981
Filed:
Mar. 30, 1977
Norinobu Wada, Ibaragi, JP;
Yoshitaka Okuno, Ibaragi, JP;
Shin-Etsu Chemical Co., Ltd., , JP;
Abstract
Unreacted residual monomer is removed from an aqueous slurry of a vinyl chloride polymerizate by a method, according to which the monomer-containing aqueous slurry continuously fed to a plate column from its top runs down by way of a cyclone-type mist separator and through a plurality of perforated plates, coming into counter-current contact with steam which is blown into the column from its bottom and ascends through the same perforated plates, to dissipate the monomer in the form of vapors, and the steam carrying the dissipated monomer vapors having entered the mist separator is subjected to mist separation and heat exchange with the slurry fed, and the resulting steam is discharged out of the column, followed by condensation to recover the monomer. The slurry having reached the bottom of the column is transferred to a flush tank where it is quenched to generate steam which is then blown into the column for recycling.