The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 1981
Filed:
Feb. 13, 1980
Applicant:
Inventors:
Gabor Kertesz, Budapest, HU;
Gyorgy Vago, Budapest, HU;
Assignee:
Hirada Stechnikai Ipari Kutato Intezet, Budapest, HU;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
204298 ; 2041 / ;
Abstract
The invention relates to a Penning sputter source which utilizes the Penning gas discharge for producing thin films by sputtering. The invented device guarantees a great productivity and effectiveness of the sputtering process by means for equalizing the magnetic field over the device and by increasing the surface of the active zone of the device. The produced layers are of equal thickness, can be composed of alloys of required composition and produced also on plastic substrates having low thermostability.