The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 1981
Filed:
Jun. 29, 1979
Yutaka Hidai, Kodaira, JP;
Nobuo Okuda, Yokohama, JP;
Tokyo Shibaura Denki Kabushiki Kaisha, Kawasaki, JP;
Abstract
An exposure apparatus using an electron beam includes a first memory for storing pattern data representing various basic patterns, a data processor for reading from the first memory the pattern data necessary to form a pattern to be drawn, a second memory for storing data which correspond to the pattern data readout from the first memory by the data processor, and an electron beam generator for generating an electron beam according to the data stored in the second memory to achieve a raster scanning on a test piece. The first memory stores pattern parameters representing said various basic patterns. The exposure apparatus further includes a dot pattern data generator which writes into the second memory dot pattern data which correspond to the pattern parameters readout from the first memory by the data processor.