The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 1981
Filed:
Jul. 23, 1979
Applicant:
Inventors:
Yoshitake Ohnishi, Tokyo, JP;
Masaki Itoh, Tokyo, JP;
Kenji Mizuno, Tokyo, JP;
Hiroshi Gokan, Tokyo, JP;
Assignee:
Nippon Electric Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430280 ; 20415914 ; 20415918 ; 20415923 ; 430296 ; 430309 ; 430917 ;
Abstract
A lithographic resist for use in microfabrication comprising a negative-type resist containing a radical scavenger capable of preventing post-irradiation reaction.
Ohnishi, Yoshitake. (1981). Negative resist and radical scavenger composition with capability of (U.S. Patent No. 4279986). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4279986
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile