The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 1981

Filed:

Jun. 23, 1980
Applicant:
Inventors:

Donald H Baird, Newton, MA (US);

Martin S McDonough, Andover, MA (US);

Assignee:

GTE Laboratories Incorporated, Waltham, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
2041 / ;
Abstract

A process for making electroluminescent films and devices by sputtering. Zinc sulfide, manganese, and copper sputtering targets are arranged in a circular configuration. RF voltages, applied to the targets, cause sputtering of the target materials. A transparent substrate with a transparent electrode formed thereon is rotated beneath the sputtering targets. An electroluminescent film including the target materials is formed on the upper surface of the transparent electrode. Concentration of the target materials in the electroluminescent film can be controlled by controlling the rf voltages applied to the sputtering targets. An electroluminescent device is completed by depositing a second electrode on the upper surface of the electroluminescent film and applying a forming voltage between the electrodes.


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