The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 1981

Filed:

May. 16, 1979
Applicant:
Inventors:

Rudolf Kirchmayr, Aesch, CH;

Louis Felder, Basel, CH;

Assignee:

Ciba-Geigy Corporation, Ardsley, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
20415924 ; 526208 ; 526222 ; 430286 ;
Abstract

Mixtures of (A) a mercaptophenyl ketone of the formula I ##STR1## in which n is 1 or 2, Ar is an unsubstituted or substituted aryl radical or a hetero-aromatic radical, R.sup.1 is hydrogen, alkyl or, if n is 1, also --SCH.sub.2 X and X, if n is 1, is one of the groups --CH(R.sup.2)--OH, --CH(R.sup.2)--O--CO--R.sup.5, --CH.sub.2 SH or --(CH.sub.2).sub.1-3 --NR.sup.3 R.sup.4, in which R.sup.2 is hydrogen, methyl, phenyl or one of the groups --CH.sub.2 OH, --CH.sub.2 --NR.sup.3 R.sup.4 or --CH.sub.2 --OR.sup.6, R.sup.3 and R.sup.4 independently of one another are hydrogen, alkyl or hydroxyalkyl, or R.sup.3 and R.sup.4 together are 1,4-butylene, 1,5-pentylene or 3-oxa-1,5-pentylene, and R.sup.5 and R.sup.6 are monovalent hydrocarbon radicals, and X, if n is 2, is alkylene, vinylene, phenylene or one of the divalent groups --CH.sub.2 S--SCH.sub.2 --, --CH(R.sup.2)--O--CO--O--CH(R.sup.2)--, --CH(R.sup.2)--O--CO--R.sup.7 --CO-- OCH(R.sup.2)--, --CO--O--R.sup.8 --O--CO--, --CH.sub.2 COO--R.sup.8 --OOCCH.sub.2 -- or --CH(OH)--CH.sub.2 --O--R.sup.8 --O--CH.sub.2 --CH(OH)--, in which R.sup.7 is a divalent hydrocarbon radical or --NH--R.sup.9 --NH--and R.sup.8 and R.sup.9 are divalent hydrocarbon radicals, and (B) an organic amine are effective initiators for the photopolymerization of ethylenically unsaturated compounds or for the photochemical crosslinking of polyolefins.


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