The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 1981
Filed:
Feb. 20, 1980
Dietrich E Riemer, Auburn, WA (US);
Rudolph E Corwin, Seattle, WA (US);
The Boeing Company, Seattle, WA (US);
Abstract
An electrically conductive, anti-reflective coating is formed on a base layer of prepared silicon in such a manner as to form a good ohmic contact therewith. If doped, the coating can serve as an impurity source during a following diffusion step, in which a PN junction is formed in the silicon. Undoped coatings may be used when the PN junction has previously been formed in the silicon. Thick film electrical contacts are then formed by screen printing on the top surface of the anti-reflective coating and then fired at high temperature, i.e. 500.degree.-1000.degree. C. The material comprising the coating is such that it acts as a barrier to the diffusion of the metal forming the electrical contacts into the silicon base layer during the firing of the thick film contacts. Since the coating is electrically conductive, a conductive path between the contacts and the silicon is established.