The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 1981
Filed:
Jan. 23, 1980
Roland G Apelgren, Vaxjo, SE;
Aktiebolaget Svenska Flaktfabriken, Stockholm, SE;
Abstract
A method of controlling the cleaning process for the cleaning of textile barrier filters, for example bag filters, subsequent to dust precipitation on the filter material. The cleaning is carried out with a cleaning system (14) comprising means (16,17,18) for distributing compressed air pulses to the filter bags (4). The gas flow often shows great variations in flow, temperature and dust content, thereby giving rise to problems in the control of the cleaning process in such a manner, that neither over-cleaning nor under-cleaning occurs. For the control, the filter load v.sub.f is measured which is the ratio of the gas flow (m.sup.3 /s) and the filter area (m.sup.2), as well as the pressure drop p.sub.f over the filter material. In applications with great temperature variations of the gas, also the absolute temperature T is measured. The measuring results are processed in an electronic unit (26) for calculating the filter resistance S, which is the ratio p.sub.f /v.sub.f, possibly standardized to a reference temperature T.sub.o by multiplication with the ratio (T.sub.o /T).sup..alpha., where .alpha. is a constant with the value 0.76 at gas temperatures below 200.degree. C. Through the filter resistance S the cleaning process is controlled by acting upon the cleaning interval, the time interval between the cleaning pulses, the cleaning pressure of the cleaning pulse, or the duration thereof.