The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 1981
Filed:
Sep. 17, 1979
Harald A Enge, Winchester, MA (US);
Varian Associates, Inc., Palo Alto, CA (US);
Abstract
An apparatus for performing double deflection scanning of charged particle beams utilizes a means for introducing variations in the angle of the charged particle beam in combination with the focal or optical properties of a sector magnet. The means for introducing angular variations receives a charged particle beam and varies the angle of, i.e., deflects, the beam in a plane to define a time modulated fan beam. Once the beam angle is varied the beam is introduced to the gap between the poles of a sector electromagnet operating in a direct current mode. The focal properties of the sector electromagnet translates the time modulated fan beam into a time modulated parallel beam. The parallel beam is double deflected and may be used, for example, as the substrate impinging beam in ion implantation equipment. Multiple sector magnets may be employed for multiple end stations.