The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 1981
Filed:
Feb. 23, 1979
Applicant:
Inventors:
Yuzo Kato, Yokohama, JP;
Yasuo Ogino, Yokohama, JP;
Ryozo Hiraga, Yokohama, JP;
Hideki Yoshinari, Yokohama, JP;
Masao Tozuka, Ohmiya, JP;
Ichiro Kano, Yokohama, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
250548 ; 356401 ;
Abstract
An alignment apparatus in which alignment marks on a mask and a wafer for producing a semiconductor circuit element are photoelectrically read and the positional deviation between the two alignment marks is detected and one of the mask and the wafer is parallel-moved in accordance with the detected amount to align the mask and wafer into a predetermined positional relation. This apparatus has the function of correcting any interval error which may be present between the alignment marks.