The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 1981
Filed:
Feb. 04, 1980
Josef Pfeifer, Therwil, CH;
Heinz Peter, Rheinfelden, CH;
Ciba-Geigy Corporation, Ardsley, NY (US);
Abstract
The partially crystalline polyamides according to the invention are obtained by reacting terephthalic acid, or an amide-forming derivative thereof, with a diamine of the formula ##STR1## in which R.sub.1 and R.sub.2 singly or together are organic radicals. The reaction mixture can also contain up to 30% by weight of other amide-forming substances (aminocarboxylic acids or lactams, or mixtures of dicarboxylic acids and diamines), provided the formation of the partial crystallinity of the resulting polyamides is retained. The polyamides are suitable for producing moulded products of the most varied types. They are particularly applicable for producing filaments and fibres.