The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 1981
Filed:
Jan. 24, 1980
Lawrence L Buhl, New Monmouth, NJ (US);
Bell Telephone Laboratories, Incorporated, Murray Hill, NJ (US);
Abstract
High speed, integrated optical directional coupler modulators utilize spaces of the order of one micron between waveguides. While one micron delineation of the waveguides can be readily obtained using conformable mask exposure techniques, diffraction effects become significant using thick glass masks required to delineate the electrodes. To overcome this problem, a two-process electrode fabrication procedure is employed. In accordance with the procedure a first pair of electrodes are deposited by a lithographic process. However, this yields a gap between electrodes that is wider than the desired gap. To reduce this distance, the process is repeated with the gap forming region of the mask laterally displaced. The result yields an electrode pattern with the desired spacing and thickness.